NEW POWER PLASMA

RPG

The environment-friendly Remote Plasma Source (Remote Plasma Generator) to improve the productivity of semiconductor and LCD manufacturing is a product generating high-density plasma that supplies F (fluorine) radicals to clean chemically the Si (silicone) accumulated in the chamber after the deposition process in a semiconductor and LCD manufacturing process. In the chamber to execute a deposition process, it is inevitable that Si powder is accumulated on the inner surface of the chamber as a process is executed, so the current chamber cleaning technology uses a technology to etch it by supplying a lot of active fluorine radicals through remote plasma with the chamber vacuum maintained. The Remote Plasma cleaning method can clean quickly membranes without damaging chambers because the plasma generator generates plasma indirectly separately from the chamber, and generate high-density plasma improved 100～1000 times compared to the existing ones through a plasma generator combined with a power system of high output, high efficiency and 400kHz hig frequency and a plasma source of high density using ferrite cores.

RPG Application

Cleaning RPG

Process RPG

Product Family

Item	Product		Physical		Application Process
Item	NF3 Gas	Power	Single Body	Separate Module	Application Process
SEMI	6 slm	10kW			PECVD
	7 slm	10kW
	8 slm	10kW
	9 slm	10kW
	14 slm	15kW			HDP CVD , PEALD, ALD
Display	36 slm	18kW/20kW			PECVD
	45 slm	22kW
	60 slm	30kW